Nano 2 Photons 3D Printer D100

• Typical processing line width			100nm
  Min Processing line width			50nm
  Min roughness			≥10nm
  Min feature line width			≤100nm (X/Y axis) and ≥300nm (Z axis)
  Min cycle time (X/Y)			≤400nm
  Scanning speed (max)			8m/s divided by the magnification (e.g., 0.8m/s at 10x)
  Splicing accuracy			≤100nm(X/Y)
  Print height(Z)			≥10mm
  Max processing size(X/Y)			100×100mm (standard configuration)

  
  
• Product description:
  Applications:
  Biomedical: cell scaffold, skin tissue, smart/live material, micro needle array, drug delivery carrier, nano robot, vascular model, topologies for cell mechanics and migration, biosensor, submicron patterning, etc.
  Scientific research:life science, materials engineering, microfluidics, micro and nano mechanics and MEMS, refractive micro optics, diffraction for optics, integrated photonics, optical sensing, quantum technology, etc.
  Industry: Maskless version manufacturing, medical device, wafer-level micro & nano processing, photonic packaging, rapid prototyping, small batch series production, etc.
  
  
  Materials:
  Photoresist: photoresist for life science, quartz glass photoresist, photoresist negative, inorganic solid photoresist, organic-inorganic hybrid photoresist, functional photoresist, etc.
  
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